Development of next-generation power devices is needed for energy saving in a low carbon society. Diamond is a potentially important power device material due to its excellent physical and electronic ...

Anisotropic etching exploits the crystallographic orientation of silicon, utilising differential etch rates along distinct planes to produce highly defined microstructures. Central to this technique ...

For a lot of reasons, home etching of PCBs is somewhat of a dying art. The main reason is the rise of quick-turn PCB fabrication services, of course; when you can send your Gerbers off and receive ...

Hafnium oxide (HfO 2) has attracted attention as a promising material for ultrathin semiconductors and other microelectronic devices. The strong ionic bond between hafnium and oxygen atoms in HfO 2 ...

A standard 13.56 MHz driven parallel plate reactive ion etcher (Trion Technology Minilock II), which allows internal anodization for use with chlorine was utilized for this experiment. Some features ...

After years in R&D, several fab tool vendors last year finally began to ship systems based a next-generation technology called atomic layer etch (ALE). ALE is is moving into 16/14nm, but it will play ...

These strategies are described in more detail in the following sections. Skeleton Etch or Anisotropic Removal of Dielectric Layers This method involves anisotropic removal of all dielectric layers ...

An example of directional etching for nanohole arrays of less than 500nm in diameter. (Image: A*STAR Institute of Materials Research and Engineering) Wet etching can be classified into two main types ...

What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...

Researchers from Taiwan’s National Nano Device Laboratories are looking to etch away defects that form when nanometre germanium transistors are built on silicon substrates. “At 14nm and smaller sizes, ...